Product Name:TPS-PFBS

IUPAC Name:triphenylsulfanium nonafluorobutane-1-sulfonate

CAS:144317-44-2
Molecular Formula:C22H15F9O3S2
Purity:95%+
Catalog Number:CM416939
Molecular Weight:562.46

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CM416939-250mg in stock ȁȁȦ
CM416939-1g in stock ɅǧǕ
CM416939-5g 1-2 Weeks ȁŴɅǧ

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Product Details

CAS NO:144317-44-2
Molecular Formula:C22H15F9O3S2
Melting Point:-
Smiles Code:[O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F.C1=CC=C(C=C1)[S+](C1=CC=CC=C1)C1=CC=CC=C1
Density:
Catalog Number:CM416939
Molecular Weight:562.46
Boiling Point:
MDL No:
Storage:

Category Infos

Photoresist
Semiconductors could be termed as the most extensively utilized substance in the modern century. Polycrystalline wafers are used to make semiconductors. A single 300-mm silicon wafer may create hundreds of chips. Photoresist coatings and materials are an essential part of their fabrication as they are the main constituents of the photolithography process during the fabrication of the semiconductors. Photoresist is a mixed liquid that is sensitive to light. Its components include: photoinitiators (including photosensitizers, photoacid generators), photoresist resins, monomers, solvents and other additives. The photoresist can transfer the required fine pattern from the photomask (mask) to the substrate to be processed through photochemical reaction and photolithography processes such as exposure and development.