Product Name:2-(2,2-Difluorovinyl)bicyclo[2.2.1]heptane

IUPAC Name:2-(2,2-difluoroethenyl)bicyclo[2.2.1]heptane

CAS:123455-94-7
Molecular Formula:C9H12F2
Purity:95%
Catalog Number:CM201462
Molecular Weight:158.19

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Product Details

CAS NO:123455-94-7
Molecular Formula:C9H12F2
Melting Point:-
Smiles Code:F/C(F)=C/C1C(C2)CCC2C1
Density:
Catalog Number:CM201462
Molecular Weight:158.19
Boiling Point:150.5±15.0°C at 760 mmHg
MDL No:MFCD22194315
Storage:Store at 2-8°C.

Category Infos

Photoresist
Semiconductors could be termed as the most extensively utilized substance in the modern century. Polycrystalline wafers are used to make semiconductors. A single 300-mm silicon wafer may create hundreds of chips. Photoresist coatings and materials are an essential part of their fabrication as they are the main constituents of the photolithography process during the fabrication of the semiconductors. Photoresist is a mixed liquid that is sensitive to light. Its components include: photoinitiators (including photosensitizers, photoacid generators), photoresist resins, monomers, solvents and other additives. The photoresist can transfer the required fine pattern from the photomask (mask) to the substrate to be processed through photochemical reaction and photolithography processes such as exposure and development.

Column Infos

Fluorinated compounds
Fluorinated compounds refers to organic or inorganic compounds containing fluorine.