cas 111281-12-0|| where to buy (4-Phenylthiophenyl)diphenylsulfonium trifluoromethanesulfonate

Product Name:(4-Phenylthiophenyl)diphenylsulfonium trifluoromethanesulfonate

IUPAC Name:diphenyl[4-(phenylsulfanyl)phenyl]sulfanium trifluoromethanesulfonate

Packing Unit	Available Stock	Price($)
CM531555-1g	in stock	ĳĳ
CM531555-5g	in stock	Łƴţ

For R&D use only.

Inquiry Form

Chemical Name

CAS Number

Quantity*

Required Specifications*
(Assay %, Material Grade etc.)

Contact Name*

Contact Email*

Meanwhile I'd like to create a registered account on CHEMENU.COM with the above email.

I'd like to receive emails related to products with similar structures to 111281-12-0 regularly via the above email.

Additional Notes

Verification code*

refresh

: CAS NO:111281-12-0; Molecular Formula:C25H19F3O3S3; Melting Point:-; Smiles Code:O=S(C(F)(F)F)([O-])=O.[S+](C1=CC=CC=C1)(C2=CC=C(SC3=CC=CC=C3)C=C2)C4=CC=CC=C4; Density:

: Catalog Number:CM531555; Molecular Weight:520.6; Boiling Point:; MDL No:; Storage:

: Photoresist; Semiconductors could be termed as the most extensively utilized substance in the modern century. Polycrystalline wafers are used to make semiconductors. A single 300-mm silicon wafer may create hundreds of chips. Photoresist coatings and materials are an essential part of their fabrication as they are the main constituents of the photolithography process during the fabrication of the semiconductors. Photoresist is a mixed liquid that is sensitive to light. Its components include: photoinitiators (including photosensitizers, photoacid generators), photoresist resins, monomers, solvents and other additives. The photoresist can transfer the required fine pattern from the photomask (mask) to the substrate to be processed through photochemical reaction and photolithography processes such as exposure and development.